2023

• Acosta, S., Casanova-Chafer, J., Llobet, E., Hemberg, A., Quintana, M., & Bittencourt, C. (02 June 2023). Plasma-Sputtered Growth of Ni-Pd Bimetallic Nanoparticles on Carbon Nanotubes for Toluene Sensing. "Chemosensors, 11" (6), 328. doi:10.3390/chemosensors11060328
  • chemosensors-11-00328.pdf

2021

• Michiels, M., Hemberg, A., Godfroid, T., Douheret, O., Colaux, J. L., Moskovkin, P., Lucas, S., Caillard, A., Thomann, A. L., Laha, P., Terryn, H., Voué, M., Panepinto, A., Snyders, R., & Konstantinidis, S. (05 July 2021). On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films. "Journal of Physics: D Applied Physics, 54" (41), 415202. doi:10.1088/1361-6463/ac118e
  • Michiels_2021.pdf
• Carette, X., Dhond, L., Hemberg, A., Thiry, D., Mincheva, R., Cailloux, J., Santana Perez, O., Cossement, D., Dubus, M., Kerjoudj, H., Raquez, J. M., & Snyders, R. (04 April 2021). Innovative One-Shot Paradigm to Tune Filler-Polymer Matrix Interface Properties by Plasma Polymer Coating in Osteosynthesis Applications. "American Chemical Society Applied Bio Materials, 4" (4), 3067-3078. doi:10.1021/acsabm.0c01429
  • carette2021.pdf

2019

• Michiels, M., Hemberg, A., Paint, Y., Caillard, A., Thomann, A. L., Colaux, J. L., Lucas, S., Panepinto, A., Britun, N., Konstantinidis, S., & Snyders, R. (24 September 2019). "Bipolar high-power pulsed magnetron sputtering (BPH) of titanium dioxide: influence of electrical parameters on the discharge and film properties" [Paper presentation]. Plathinium 2019, Antibes, France.

2015

• Struzzi, C., Scardamaglia, M., Hemberg, A., Petaccia, L., Colomer, J.-F., Snyders, R., & Bittencourt, C. (26 November 2015). Plasma fluorination of vertically aligned carbon nanotubes: Functionalization Thermal Stability. "Beilstein Journal of Nanotechnology, 6", 2263-2271. doi:10.3762/bjnano.6.232

• Bittencourt, C., Saikia, N., Struzzi, C., Snyders, R., Colomer, J.-F., Matteo, A., Gregoratti, L., Hemberg, A., & Ewels, C. (2015). "Plasma Fluorination of Vertically Aligned Carbon Nanotubes: Tuning Wettability" [Paper presentation]. The 16th International Conference on the Science and Application of Nanotubes (NT15), Nagoya, Japan.

2014

• Struzzi, C., Scardamaglia, M., Hemberg, A., Snyders, R., & Bittencourt, C. (23 August 2014). "Plasma functionalization of vertically aligned carbon nanotubes" [Paper presentation]. NanoteC14 Carbon Nanoscience and Nanotechnology, Brussels, Belgium.
  • NanoteC14Abstract_Claudia_Struzzi.doc

• Struzzi, C., Scardamaglia, M., Hemberg, A., Jadot, J., Paint, Y., Colomer, J. F., Petaccia, L., Snyders, R., & Bittencourt, C. (02 July 2014). "Plasma functionalization of vertically aligned carbon nanotubes" [Poster presentation]. The 1st Research Day of the Materials Research Institute, Mons, Belgium.

2012

• Hemberg, A., Renaux, F., Dauchot, J.-P., Konstantinidis, S., & Snyders, R. (26 October 2012). "Ion flux- structure relationship during magnetron sputtering of WO3. Applications to the design of NO2 sensors" [Poster presentation]. 5th CIRMAP Anniversary Workshop, Mons, Belgium.

2011

• Hemberg, A., Konstantinidis, S., Renaux, F., Dauchot, J.-P., & Snyders, R. (28 October 2011). Ion flux-film structure relationship during magnetron sputtering of WO3. "European Physical Journal: Applied Physics, 56".

• Hemberg, A., Renaux, F., Dauchot, J.-P., Snyders, R., & Konstantinidis, S. (30 October 2011). "HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF WO3. INFLUENCE OF THE PULSE PARAMETERS ON THE DISCHARGE" [Paper presentation]. AVS 58th Annual International Symposium and Exhibition, Nashville, United States - Tennessee.
• Snyders, R., Balhamri, A., Hemberg, A., & Konstantinidis, S. (20 September 2011). "Reactive IPVD processes: new insights into the thin films growth mechanisms" [Paper presentation]. the 8th asian-European International Conference on Plasma Surface Engineering, Dalian city, China.
• Hemberg, A., Konstantinidis, S., Renaux, F., Dauchot, J.-P., & Snyders, R. (05 July 2011). "Ion flux-film structure relationship during magnetron sputtering of WO3" [Paper presentation]. 18th International Colloquium on plasma processes , CIP 2011, Nantes, France.

• Hemberg, A., Konstantinidis, S., Renaux, F., Dauchot, J.-P., & Snyders, R. (22 March 2011). "REACTIVE HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF WO3: INFLUENCE OF THE PULSE PARAMETERS ON THE DISCHARGE AND FILM CHARACTERISTICS" [Poster presentation]. 6ème édition de la Matinée des Chercheurs (MDC 2011), Mons, Belgium.