2013

• Thiry, D., Britun, N., Konstantinidis, S., Dauchot, J.-P., Guillaume, M., Cornil, J., & Snyders, R. (16 April 2013). Experimental and Theoretical Study of the Effect of the Inductive-to-Capacitive Transition in Propanethiol Plasma Polymer Chemistry. "Journal of Physical Chemistry, 117" (19), 98-43-9851. doi:10.102/jp400829z

• Thiry, D., Britun, N., Konstantinidis, S., Dauchot, J.-P., Denis, L., & Snyders, R. (12 March 2013). "Effect of a transition from capacitive to inductive mode on propanethiol plasma polymer properties" [Poster presentation]. 7ème édition de la Matinée de Chercheurs, Mons, Belgium.

2012

• Hemberg, A., Dauchot, J.-P., Snyders, R., & Konstantinidis, S. (04 June 2012). Evaporation assisted high power impulse magnetron sputtering: The deposition of tungsten oxide as a case study. "Journal of Vacuum Science and Technology. A, Vacuum, Surfaces, and Films, 30" (4).
• Nouvellon, C., Michiels, M., Dauchot, J.-P., Archambeau, C., Laffineur, F., Silberberg, E., Delvaux, S., Cloots, R., Konstantinidis, S., & Snyders, R. (19 February 2012). Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes. "Surface and Coatings Technology, 206" (16), 3542-3549.
• Thiry, D., Britun, N., Konstantinidis, S., Dauchot, J.-P., Denis, L., & Snyders, R. (15 February 2012). Altering the sulfur content in the propanethiol plasma polymers using the capacitive-to-inductive mode transition in inductively coupled plasma discharge. "Applied Physics Letters, 100" (7). doi:10.1063/1.3686902

• Thiry, D., Britun, N., Konstantinidis, S., Dauchot, J.-P., Guillaume, M., Cornil, J., & Snyders, R. (26 October 2012). "Synthesis of thiol-based plasma polymers films : correlation between plasma and film chemistry" [Paper presentation]. 5th CIRMAP Anniversary Workshop, Mons, Belgium.
• Hemberg, A., Konstantinidis, S., Dauchot, J.-P., & Snyders, R. (11 September 2012). "ION FLUX-FILM STRUCTURE RELATIONSHIP DURING REACTIVE MAGNETRON SPUTTERING OF TUNGSTEN" [Paper presentation]. 13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany.
• Thiry, D., Britun, N., Konstantinidis, S., Dauchot, J.-P., Guillaume, M., Cornil, J., & Snyders, R. (11 September 2012). "Study of the transition between capacitive and inductive modes on propanethiol plasma polymer properties: correlation between plasma and film chemistry" [Paper presentation]. 13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany.

2011

• Hemberg, A., Konstantinidis, S., Renaux, F., Dauchot, J.-P., & Snyders, R. (28 October 2011). Ion flux-film structure relationship during magnetron sputtering of WO3. "European Physical Journal: Applied Physics, 56".

• Hemberg, A., Renaux, F., Dauchot, J.-P., Snyders, R., & Konstantinidis, S. (30 October 2011). "HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF WO3. INFLUENCE OF THE PULSE PARAMETERS ON THE DISCHARGE" [Paper presentation]. AVS 58th Annual International Symposium and Exhibition, Nashville, United States - Tennessee.
• Thiry, D., Britun, N., Konstantinidis, S., Dauchot, J.-P., Denis, L., & Snyders, R. (06 July 2011). "Effect of a transition from capacitive to inductive mode on propanethiol plasma polymer properties" [Paper presentation]. 18th International Colloquium on plasma processes , CIP 2011, Nantes, France.
  • Abstract_Thiry Damien.pdf
• Hemberg, A., Konstantinidis, S., Renaux, F., Dauchot, J.-P., & Snyders, R. (05 July 2011). "Ion flux-film structure relationship during magnetron sputtering of WO3" [Paper presentation]. 18th International Colloquium on plasma processes , CIP 2011, Nantes, France.

• Thiry, D., Britun, N., Konstantinidis, S., Dauchot, J.-P., Denis, L., & Snyders, R. (11 October 2011). "Effect of a transition from capacitive to inductive mode on propanethiol plasma polymer properties" [Poster presentation]. 16th european plasma summer school, Bad Honnef, Germany.
• Hemberg, A., Konstantinidis, S., Renaux, F., Dauchot, J.-P., & Snyders, R. (22 March 2011). "REACTIVE HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF WO3: INFLUENCE OF THE PULSE PARAMETERS ON THE DISCHARGE AND FILM CHARACTERISTICS" [Poster presentation]. 6ème édition de la Matinée des Chercheurs (MDC 2011), Mons, Belgium.

2010

• Nouvellon, C., Michiels, M., Dauchot, J.-P., Hecq, M., Snyders, R., Archambeau, C., Laffineur, F., Silberberg, E., Jacobs, N., Cosijns, B., Hevesi, K., Delvaux, S., & Cloots, R. (22 March 2010). "HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS) DEVELOPMENT AND APPLICATIONS FOR TiO2 COATINGS" [Paper presentation]. European conference on Nano film, Liège, Belgium.

• Hemberg, A., Konstantinidis, S., Renaux, F., Bittencourt, C., Dauchot, J.-P., & Snyders, R. (09 December 2010). "High-Power impulse magnetron sputtering of WO3 : Study of the influence of the pulse parameters on the deposition rate" [Poster presentation]. Ninth International Conference on Reactive Sputter Deposition 2010 - RSD2010, Gent, Belgium.
• Hemberg, A., Konstantinidis, S., Bittencourt, C., Renaux, F., Dauchot, J.-P., & Snyders, R. (18 November 2010). "High-Power impulse magnetron sputtering of WO3 : Study of the influence of the pulse parameters on the deposition rate" [Poster presentation]. Ecole doctorale MAIN, Mons, Belgium.
• Hemberg, A., Navio Bernabeu, C., Konstantinidis, S., Renaux, F., Bittencourt, C., Snyders, R., Hecq, M., & Dauchot, J.-P. (08 October 2010). "Structural characterization of tungsten oxide thin films deposited by balanced and unbalanced magnetron sputtering" [Poster presentation]. Doctoral day on sputtering, Mons, Belgium.
• Hemberg, A., Konstantinidis, S., Bittencourt, C., Renaux, F., Dauchot, J.-P., & Snyders, R. (15 June 2010). "High-Power impulse magnetron sputtering of WO3 : Study of the influence of the pulse parameters on the deposition rate" [Poster presentation]. MIATEC 2010, Metz, France.
• Hemberg, A., Navio Bernabeu, C., Konstantinidis, S., Renaux, F., Bittencourt, C., Dauchot, J.-P., Hecq, M., & Snyders, R. (23 April 2010). "Structural characterization of tungsten oxide thin films deposited by balanced and unbalanced magnetron sputtering" [Poster presentation]. Journée de l'école Doctorale Thématique CHIM, UMONS, Unknown/unspecified.
• Balhamri, A., Konstantinidis, S., Dauchot, J.-P., Hecq, M., & Snyders, R. (06 April 2010). "Plasma-surface interaction during High-Power Impulse Magnetron Sputtering" [Poster presentation]. PIRM 4 - 4ème congrès International Physique des Interactions Rayonnement Matière, Dakhla, Morocco.
• Hemberg, A., Navio Bernabeu, C., Konstantinidis, S., Renaux, F., Snyders, R., Bittencourt, C., Hecq, M., & Dauchot, J.-P. (17 February 2010). "Effect of the geometry magnetron sputtering on the growth of tungsten oxide thin films" [Poster presentation]. Matinée des Chercheurs, Bruxelles, Belgium.

2004

• Konstantinidis, S., Ricard, A., Ganciu, M., Dauchot, J.-P., Ranea, C., & Hecq, M. (01 March 2004). Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy. "Journal of Applied Physics, 95" (5), 2900-2905.

2003

• Konstantinidis, S., Ricard, A., Ganciu, M., Dauchot, J.-P., Wautelet, M., & Hecq, M. (2003). "A Study of an Ionized Magnetron Source by Pulsed Absorption Spectroscopy" [Paper presentation]. Society of Vacuum Coaters 46th Annual Technical Conference, San Francisco, United States.

2002

• Ricard, A., Nouvellon, C., Konstantinidis, S., Dauchot, J.-P., Wautelet, M., & Hecq, M. (19 July 2002). Density and temperature in an inductively amplified magnetron discharge for titanium deposition. "Journal of Vacuum Science and Technology. A, Vacuum, Surfaces, and Films, 20" (4), 1488-1491.
• Nouvellon, C., Konstantinidis, S., Dauchot, J.-P., Wautelet, M., Jouan, P.-Y., & Ricard, A. (01 July 2002). Emission spectrometry diagnostic of sputtered titanium in magnetron amplified discharges. "Journal of Applied Physics, 92" (1), 32-36.
• Del Re, M., Gouttebaron, R., Dauchot, J.-P., Leclère, P., Lazzaroni, R., Wautelet, M., & Hecq, M. (28 June 2002). Growth and morphology of magnetron sputter deposited silver films. "Surface and Coatings Technology, 151-152", 86-90.