Research
The goal of S. Konstantinidis’ research is to contribute towards the fundamental understanding of plasma-surface interactions. His studies focus on low-pressure plasma-based methods, in particular magnetron sputtering processes, including High-Power Impulse Magnetron Sputtering (HiPIMS), for the synthesis of functional thin films and nano-objects. Besides, he also investigates Glancing Angle Deposition (GLAD) and sputtering onto liquid substrates. To achieve this goal, advanced plasma analysis and surface characterization tools are utilized.
Key words: magnetron sputtering - plasma diagnostics – surfaces – thin films – nano-objects